Similarity between Strain Fields Induced by the Xe/NH3 Plasma Nitridation and the Kr/O2 Plasma Oxidation Revealed by a Multi-Wave X-ray Diffraction Phenomenon-Reference-Cited by-同舟云学术

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Similarity between Strain Fields Induced by the Xe/NH3 Plasma Nitridation and the Kr/O2 Plasma Oxidation Revealed by a Multi-Wave X-ray Diffraction Phenomenon

Published:2008 Issue:3 Volume:33 Page:607-610
ISSN:1382-3469
Container-title:Transactions of the Materials Research Society of Japan
language:en
Short-container-title:Trans. Mat. Res. Soc. Japan

Author:

Yashiro Wataru,Yoda Yoshitaka,Matsushita Yuichiro,Aratani Takashi,Teramoto Akinobu,Hattori Takeo,Miki Kazushi

Publisher

The Materials Research Society of Japan

Link

https://www.jstage.jst.go.jp/article/tmrsj/33/3/33_607/_pdf

Reference14 articles.

1. [1] W. Yashiro, K. Sumitani, T. Takahashi, Y. Yoda, and K. Miki, Surf Sci. 550, 93-105 (2004).

2. [2] W. Yashiro, K. Sumitani, T. Takahashi, Y. Yoda, K. Takahashi, T. Hattori, and K. Miki, International Workshop on Dielectric Thin Films for Future ULSI Devices - Science and Technology (IWDTF2004), 109-110 (2004).

3. [3] W. Yashiro, S. Kusano, K. Miki, Y. Yoda, K. Takahashi, M. Yamamoto, and T. Hattori, Trans. Mat. Res. Soc. Jpn. 32, 227-229 (2007).

4. [4] W. Yashiro, Y. Yoda, K. Takahashi, M. Yamamoto, T. Hattori, and K. Miki, J Phys: Conf Ser. 83, 012009 (2007).

5. [5] T. Takahashi and S. Nakatani, Surf Sci., 326, 347-360 (1995).

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