Roles of Gate-Oxide Thickness Reduction in Scaling Bulk and Thin-Body Tunnel Field-Effect Transistors
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Published:2017-06-16
Issue:3
Volume:55
Page:316
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ISSN:2525-2518
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Container-title:Vietnam Journal of Science and Technology
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language:
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Short-container-title:JST
Author:
Chien Nguyen Dang,Anh Dao Thi Kim,Shih Chun-Hsing
Abstract
Tunnel field-effect transistor (TFET) has recently been considered as a promising candidate for low-power integrated circuits. In this paper, we present an adequate examination on the roles of gate-oxide thickness reduction in scaling bulk and thin-body TFETs. It is shown that the short-channel performance of TFETs has to be characterized by both the off-current and the subthreshold swing because their physical origins are completely different. The reduction of gate-oxide thickness plays an important role in maintaining low subthreshold swing whereas it shows a less role in suppressing off-state leakage in short-channel TFETs with bulk and thin-body structures. When scaling the gate-oxide thickness, the short-channel effect is suppressed more effectively in thin-body TFETs than in bulk devices. Clearly understanding the roles of scaling gate-oxide thickness is necessary in designing advanced scaled TFET devices.
Publisher
Publishing House for Science and Technology, Vietnam Academy of Science and Technology (Publications)
Cited by
1 articles.
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