Effect of frequency from 'low frequency' to microwave on the plasma deposition of thin films-Reference-Cited by-同舟云学术

Effect of frequency from 'low frequency' to microwave on the plasma deposition of thin films

Published:1988-01-01 Issue:5 Volume:60 Page:815-820
ISSN:1365-3075
Container-title:Pure and Applied Chemistry
language:
Short-container-title:

Author:

Wertheimer M. R.,Moisan M.,Klemberg-Sapieha J. E.,Claude R.

Publisher

Walter de Gruyter GmbH

Subject

General Chemical Engineering,General Chemistry

Link

https://www.degruyter.com/document/doi/10.1351/pac198860050815/pdf

Reference5 articles.

1. Wertheimer and Plasma and Plasma Proce - ss ina ( submi t ted ) a u Cur r and Wang Thin lms Wertheiner and IEEE Tess ier Can xxx Plasma Polymer izat ion Academic Press New York Kaganowicz and Jaw abo ra to r ies Pr inceton ech;Claude;Chem Trans Phys Appl Polym Symp,1986

2. Zakrzevtski i a discharge plasmas eniim ldew York - - - Plasma Plasma Process l Lepr ince rans lasma Science ps i n press US Patent a a i Th in i lms Sos is io qer the imer and Weissf loch;Moisan;Chem Appl Phys,1987

3. pp presented a t th Can Congress Quebec unpub Lev ins te in Electrochem;Sinha;Chem Eng October,1984

4. Phenomena i Gases ( Con oaoers ) beau f tsher Margot paper a t the Plasma Chemistry Tokyo a and Loure i ro a;Ricard;Appl Phys Appl Phys,1984

5. REFERENCES Werthi imer and doisan and;Ricard;Sci Technol Technol,1986

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