Role of high temperature chemistry in CVD (chemical vapor deposition) processing

Author:

Spear K. E.,Kirkx R. R.

Publisher

Walter de Gruyter GmbH

Subject

General Chemical Engineering,General Chemistry

Cited by 14 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

1. Mechanisms and Kinetics of the Hydrogen-Free CVD of Protective Tantalum Coatings;Journal of Surface Investigation: X-ray, Synchrotron and Neutron Techniques;2022-04

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3. Kinetic 2D Crystals via Topochemical Approach;Advanced Materials;2021-05-19

4. Mobilities in ambipolar field effect transistors based on single-walled carbon nanotube network and formed on a gold nanoparticle template;Applied Physics Letters;2014-04-07

5. Refractory Metals, Ceramics, and Composites for High-Temperature Structural and Functional Applications;High Temperature Materials and Mechanisms;2014-01-29

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