Substrate temperature dependence of electrical conduction in nanocrystalline CdTe:TiO2 sputtered films

Author:

Sharma S. N.1,Shivaprasad S. M.2,Kohli Sandeep3,Rastogi A. C.1

Affiliation:

1. 1Materials Division, National Physical Laboratory, Dr. K. S. Krishnan Marg, New Delhi 110012, India

2. 2Surface Physics Group, National Physical Laboratory, Dr. K. S. Krishnan Marg, New Delhi 110012, India

3. 3Department of Chemistry, Colorado State University, Fort Collins, CO 80523, USA

Abstract

TiO2 thin films with high volume fraction (∼50­70 %) of CdTe nanoparticles were prepared by radio frequency (rf) magnetron sputtering from a composite TiO2:CdTe target. With increase in substrate temperature Ts from room temperature (RT ∼300 K) to 373 K, a transition from an ordered structure exhibiting metallic-type conduction to a disordered structure exhibiting nonmetallic-type conduction was observed for annealed nanocrystalline CdTe:TiO2 films. The annealed RT-deposited films showed a large coalescence of distinct islands (size ∼0.3­0.7 µm) mainly of Cd and CdTe, and as result, a 3D network was realized. For metallic regime films, electrical conduction is essentially due to electrical percolation through Cd/CdTe crystallites embedded in an amorphous TiO2 matrix. However, the annealed high Ts films consisted of noncoalescent, small islands (size ∼0.15­0.3 µm) of Cd and CdTe embedded in amorphous TiO2 matrix. Here, the conduction is essentially by hopping mechanism via thermally activated tunneling.

Publisher

Walter de Gruyter GmbH

Subject

General Chemical Engineering,General Chemistry

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