Plasma synthesis of catalytic thin films-Reference-Cited by-同舟云学术

Plasma synthesis of catalytic thin films

Published:2002-01-01 Issue:3 Volume:74 Page:471-474
ISSN:1365-3075
Container-title:Pure and Applied Chemistry
language:
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Author:

Thomann A.-L.¹,Rozenbaum J. P.¹,Brault P.¹,Andreazza C.²,Andreazza P.²,Rousseau B.²,Estrade-Szwarckopf H.²,Berthet A.³,Bertolini J. C.³,Aires F. J. Cadete Santos³,Monnet F.³,Mirodatos C.³,Charles Christine⁴,Boswell R.⁴

Affiliation:

1. 1GREMI UMR 6606 CNRS, Université d'Orléans BP 6744 ORLEANS Cedex 2, France

2. 2CRMD, UMR 6619 CNRS, 45067 ORLEANS Cedex 2, France

3. 3IRC UPR 5401 CNRS, Av. A. Einstein; F-69626 VILLEURBANNE Cedex, France

4. 4Space Plasma and Plasma Processing, Plasma Research Laboratory, The Australian National University, Canberra ACT 0200, Australia

Abstract

Plasma sputter deposition is introduced in the field of catalyst preparation. It is shown that growth kinetics and morphologies are determined by ion to neutral flux ratio and kinetic energies of sputtered atoms. Catalytic activity of such catalysts compares very well with classical catalysts.

Publisher

Walter de Gruyter GmbH

Subject

General Chemical Engineering,General Chemistry

Link

https://www.degruyter.com/document/doi/10.1351/pac200274030471/pdf

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