New Approach for Monitoring a Direct Laser Interference Patterning Process Using a Combination of an Infrared Camera and a Diffraction Measurement System-Reference-Cited by-同舟云学术

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New Approach for Monitoring a Direct Laser Interference Patterning Process Using a Combination of an Infrared Camera and a Diffraction Measurement System

Published:2021-10 Issue: Volume: Page:
ISSN:1880-0688
Container-title:Journal of Laser Micro/Nanoengineering
language:
Short-container-title:JLMN

Author:

Publisher

Japan Laser Processing Society

Subject

Electrical and Electronic Engineering,Industrial and Manufacturing Engineering,Instrumentation

Cited by 4 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Structuring Surfaces at the Speed of Light;Biomedical Materials & Devices;2023-07-14

2. Compact Optical System Based on Scatterometry for Off-Line and Real-Time Monitoring of Surface Micropatterning Processes;Optics;2023-02-24

3. Analyzing the Electromagnetic Radiations Emitted during a Laser-based Surface Pre-Treatment Process for Aluminium using Diode Sensors as an Approach for High-Resolution Online Monitoring;Journal of Laser Micro/Nanoengineering;2022-12

4. Ten Open Questions about Laser-Induced Periodic Surface Structures;Nanomaterials;2021-12-07

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