Principles and mechanisms of sub-micrometer particle removal by CO2 cryogenic technique
Author:
Publisher
Informa UK Limited
Subject
Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Mechanics of Materials,General Chemistry
Link
http://www.tandfonline.com/doi/pdf/10.1080/10256018808623883
Reference15 articles.
1. Wagener, T. and Weygand, J. 2004.Proceedings of 7th Int. Symposium on Ultra Clean Processing of Silicon Surfaces181Brussels, Belgium
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