Re-Evaluation of Calibration and Measurement Capabilities of Pitch Calibration Systems Designed by Using the Diffraction Method-Reference-Cited by-同舟云学术

Re-Evaluation of Calibration and Measurement Capabilities of Pitch Calibration Systems Designed by Using the Diffraction Method

Published:2017-08-30 Issue:5 Volume:11 Page:691-698
ISSN:1883-8022
Container-title:International Journal of Automation Technology
language:en
Short-container-title:IJAT

Author:

Misumi Ichiko,Kitta Jun-ichiro,Kizu Ryosuke,Hirai Akiko, ,

Abstract

One-dimensional grating is one of the most important standards that are used to calibrate magnification of critical-dimension scanning electron microscopes (CD-SEMs) in the semiconductor industry. Long-term stability of pitch calibration systems is required for the competence of testing and calibration laboratories determined in ISO/IEC 17025:2005. In this study, calibration and measurement capabilities of two types of pitch calibration systems owned by a calibration laboratory are re-evaluated through comparison to a reference value and its expanded uncertainty given by a metrological atomic force microscope (metrological AFM) at National Metrology Institute of Japan (NMIJ), AIST. The calibration laboratory’s pitch calibration systems are designed by using the diffraction method (optical and X-ray).

Publisher

Fuji Technology Press Ltd.

Subject

Industrial and Manufacturing Engineering,Mechanical Engineering

Reference23 articles.

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