Fabrication of a Bottom Electrode for a Nano-scale Beam Resonator Using Backside Exposure with a Self-aligned Metal Mask-Reference-Cited by-同舟云学术

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Fabrication of a Bottom Electrode for a Nano-scale Beam Resonator Using Backside Exposure with a Self-aligned Metal Mask

Published:2009-12-01 Issue:4 Volume:4 Page:546-551
ISSN:1975-0102
Container-title:Journal of Electrical Engineering and Technology
language:en
Short-container-title:Journal of Electrical Engineering and Technology

Author:

Lee Yong-Seok,Jang Yun-Ho,Bang Yong-Seung,Kim Jung-Mu,Kim Jong-Man,Kim Yong-Kweon

Publisher

The Korean Institute of Electrical Engineers

Subject

Electrical and Electronic Engineering

Link

http://ocean.kisti.re.kr/downfile/crosscheck/kiee/JAKO200909659868124.pdf

Cited by 3 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Self-aligned patterning on β-Ga₂O₃ substrates via backside-exposure photolithography;Japanese Journal of Applied Physics;2023-01-01

2. Effects of a bottom electrode on feed-through capacitance and electrical transmission of an MEMS resonator;Microelectronic Engineering;2012-09

3. Feed-through capacitance reduction for a micro-resonator with push–pull configuration based on electrical characteristic analysis of resonator with direct drive;Sensors and Actuators A: Physical;2011-11

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