Submicron machining and biomolecule immobilization on porous silicon by electron beam-Reference-Cited by-同舟云学术

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Submicron machining and biomolecule immobilization on porous silicon by electron beam

Published:2012-09-25 Issue:1 Volume:7 Page:
ISSN:1556-276X
Container-title:Nanoscale Research Letters
language:en
Short-container-title:Nanoscale Res Lett

Author:

Imbraguglio Dario,Giovannozzi Andrea Mario,Nastro Annalisa,Rossi Andrea Mario

Publisher

Springer Science and Business Media LLC

Subject

Condensed Matter Physics,General Materials Science

Link

http://link.springer.com/content/pdf/10.1186/1556-276X-7-530.pdf

Reference22 articles.

1. Vieu C, Carcenac F, Pepin A, Chen Y, Mejias M, Lebib A, Manin-Ferlazzo L, Couraud L, Launois H: Electron beam lithography: resolution limits and applications. Appl Surf Sci 2000, 164: 111–117. 10.1016/S0169-4332(00)00352-4

2. Tseng AA, Chen K, Chen CD, Ma KJ: Electron beam lithography in nanoscale fabrication: recent development. IEEE Trans Electron Packag Manuf 2003, 26: 141–149. 10.1109/TEPM.2003.817714

3. Rocchia M, Borini S, Rossi AM, Boarino L, Amato G: Submicrometer functionalization of porous silicon by electron beam lithography. Adv Mater 2003, 15: 1465–1469. 10.1002/adma.200304919

4. Borini S, D'Auria S, Rossi M, Rossi AM: Writing 3D protein nanopatterns onto a silicon nanosponge. Lab Chip 2005, 5: 1048–1052. 10.1039/b505089h

5. Cullis AG, Canham LT, Calcott PDJ: The structural and luminescence properties of porous silicon. J Appl Phys 1997, 82: 909–965. 10.1063/1.366536

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