Correlation between Al grain size, grain boundary grooves and local variations in oxide barrier thickness of Al/AlOx/Al tunnel junctions by transmission electron microscopy
Author:
Funder
Stiftelsen för Strategisk Forskning (SE)
Vetenskapsrådet (SE)
Knut och Alice Wallenbergs Stiftelse (SE)
Publisher
Springer Science and Business Media LLC
Subject
Multidisciplinary
Link
http://link.springer.com/content/pdf/10.1186/s40064-016-2418-8.pdf
Reference42 articles.
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2. Aumentado J, Keller Mark W, Martinis John M, Devoret MH (2004) Nonequilibrium quasiparticles and 2e periodicity in single-cooper-pair transistors. Phys Rev Lett 92:066802
3. Averin DV, Likharev KK (1986) Coulomb blockade of single-electron tunneling, and coherent oscillations in small tunnel junctions. J Low Temp Phys 62:345
4. Cai N, Zhou G, Mller K, Starr DE (2011) Effect of oxygen gas pressure on the kinetics of alumina film growth during the oxidation of Al(111) at room temperature. Phys Rev B 84:125445
5. Cai N, Zhou G, Muller K, Starr DE (2012) Temperature and pressure dependent Mott potentials and their influence on self-limiting oxide film growth. Appl Phys Lett 101:171605
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