Overcoming delamination in two-photon lithography for improving fabrication of 3D microstructures

Abstract

AbstractTwo-photon lithography has emerged as a highly effective method for fabricating intricate three-dimensional (3D) microstructures. It enables the rapid fabrication of 3D microstructures, unlike conventional two-dimensional nanopatterning. Researchers have extensively investigated two-photon polymerization (TPP) for the fabrication of diverse 3D micro/nanodevices with high resolution. TPP can be applied in cell cultures, metamaterials, optical materials, electrical devices, and fluidic devices, to name a few. In this study, we investigate the applications and innovative research pertaining to TPP, which is an effective fabrication technique with significant advancement in various fields. In particular, we attempt to determine the reasons that cause the detachment or delamination of 3D microstructures during the development process and propose some solutions. A step-by-step fabrication process for a glass substrate, from photoresist deposition to laser scanning and the dissolution of the uncured photoresist, is presented. Defects such as pattern delamination are discussed, with emphasis on the cell scaffold structure and microlens array. Understanding and addressing these defects are vital to the success of 3D microstructure fabrication via TPP.