Author:
Stronski A.,Achimova E.,Paiuk O.,Meshalkin A.,Abashkin V.,Lytvyn O.,Sergeev S.,Prisacar A.,Triduh G.
Publisher
Springer Science and Business Media LLC
Subject
Condensed Matter Physics,General Materials Science
Reference38 articles.
1. Kostishin MT, Mikhailovskaya EV, Romanenko PF, Sandul GA (1965) About the photographic sensitivity of the thin semiconductor layers. J. Applied and Scientific Photography and Cinematography 10(6):450–451 (in Russian)
2. Mizushima Y, Yoshikawa A (1982) Photoprocessing and lithographic applications. In: Amorphous Semiconductor, Technologies & Devices. Tokyo e.a, Amsterdam, pp 277–295
3. Klabes R, Thomas A, Kluge G, Süptitz P, Grötzschel R (1988) Ion-beam induced silver doping in Ag2Se/GeSe – resist system. Phys Stat Sol A 106:57–65
4. Saito K, Utsigi Y, Yoshikawa A (1988) X-ray lithography with Ag-Se/GeSe inorganic resist using synchrotron radiation. J Appl Phys 63:565–567
5. Stronski A. Production of metallic patterns with the help of high resolution inorganic resists. Microelectronic Interconnections and Assembly. NATO ASI Series. 3:High Technology, 1998, p. 263–293.
Cited by
21 articles.
订阅此论文施引文献
订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献