1. Spaeth, M.L., Manes, K.R., Widmayer, C.C., Williams, W., Whitman, P.A., Henesian, M.: The National Ignition Facility Wavefront Requirements and optical architecture. Proc. SPIE. 5341, 25–42 (2004)
2. Yu, G., Li, H., Walker, D.D.: Removal of mid spatial-frequency features in mirror segments. J. Eur. Opt. Soc. 6, 11044 (2011)
3. Glatzel, H., Ashworth, D., Bremer, M., Chin, R., Cummings, K., Girard, L., Goldstein, M., Gullikson, E., Hudyma, R., Kennon, J., Kestner, B., Marchetti, L., Naulleau, P., Soufli, R., Spiller, E.: Projection optics for extreme ultraviolet lithography (EUVL) micro-field exposure tools (METs) with a numerical aperture of 0.5. Proc of. SPIE. 8679, 867917 (2013)
4. Shafrir, S.N., Lambropoulos, J.C., Jacobs, S.D.: A magnetorheological polishing-based approach for studying precision microground surfaces of tungsten carbides. Precis. Eng. 31(2), 83–93 (2007)
5. Arnold, T., Pietag, F.: Ion beam figuring machine for ultra-precision silicon spheres correction. Precis. Eng. 41, 119–125 (2015)