Abstract
AbstractIn this work, Fabrication, and characterization of Cu-doped ZnO thin films deposited on porous silicon (PSi) substrates have been reported using electrochemical deposition (ECD) technique. The influence of Cu-doping concentrations on morphology, structure, and electrical characteristics of zinc oxide (ZnO) thin films were presented. X-ray diffraction analysis (XRD) has been used to characterize the lattice constants, average size, in-plane (along a-axis) and out of plane (along c-axis) strains for the Cu–ZnO crystals. The effects of Cu-doping concentration on crystal parameters were also investigated from the XRD analysis. The samples were used for UV-sensing applications. In addition, Cu-doped ZnO and pure ZnO metal–semiconductor-metal photodetector, with Cu as electrode contacts were successfully produced for ultraviolet (UV) detection. The I-V (current–voltage) characteristics were used to study the sensing enhancement. Finally, the UV photodetector based on Cu-doped ZnO films was successfully fabricated and shows a five times enhancement in the sensitivity to UV light compared to that of pure ZnO photodetector.
Funder
Deanship of Scientific Research, Imam Mohammed Ibn Saud Islamic University
Publisher
Springer Science and Business Media LLC
Reference46 articles.
1. Zou D, Jamal RT, Abdiryim L, Liu H. Construction and properties of ZnO/poly (EDOT-Pyridine-EDOT) core/shell heterostructure nanoarrays for UV photodetector. Synthetic Metals. 2022;291:117192.
2. Belhaj M, Dridi C, Yatskiv R, Grym J. The improvement of UV photodetection based on polymer/ZnO nanorod heterojunctions. Org Electron. 2020;77:105545.
3. Sha R, Basak A, Maity PC, Badhulika S. ZnO nano-structured based devices for chemical and optical sensing applications. Sensors Actuators Reports. 2022;4:100098.
4. Choy JH, Jang ES, Jang JH, Him YW. Soft solution route to directionally grown ZnO nanorod arrays on Si wafer. Room-Temperature Ultraviolet Laser Adv Mater. 2003;15:1911–4.
5. Novotny I, Sutta P, Mika F, Trarozek V. Piezoelectric ZnO thin films prepared by cyclic sputtering and etching technology. Proceedings of the International Conference on Microelectronics, IEEE Piscataway, New Jersey.1995; 65–68.