Diagnosis and Cleaning of Carbon Contamination on SiO<sub>2</sub> Thin Film-Reference-Cited by-同舟云学术

Diagnosis and Cleaning of Carbon Contamination on SiO₂ Thin Film

Published:2009 Issue:3 Volume:15 Page:337-340
ISSN:1341-1756
Container-title:Journal of Surface Analysis
language:en
Short-container-title:JSA

Author:

Kurokawa Akira¹,Odaka Kenji²,Azuma Yasushi²,Fujimoto Toshiyuki²,Kojima Isao²

Affiliation:

1. Research and Innovation Promotion Office, National Institute of Advanced Industrial Science and Technology (AIST)

2. Surface and Thin Film Standards Section, National Metrology Institute of Japan (NMIJ), AIST

Publisher

Surface Analysis Society of Japan

Link

https://www.jstage.jst.go.jp/article/jsa/15/3/15_337/_pdf

Reference1 articles.

1. [1] Akira Kurokawa, Kenji Odaka, Hidehiko Nonaka, Ken Nakamura, Toshiyuki Fujimoto, and Shingo Ichimura; Thickness Stability of Silicon Dioxide Film with Water Immersion; ECASIA’05 abstract, p184 (2005).

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