The influence of substrate bias voltage on the electrochemical properties of ZrN thin films deposited by radio-frequency magnetron sputtering: Biomedical application-Reference-Cited by-同舟云学术

The influence of substrate bias voltage on the electrochemical properties of ZrN thin films deposited by radio-frequency magnetron sputtering: Biomedical application

Published:2019-09-28 Issue:7 Volume:70 Page:112-116
ISSN:1339-309X
Container-title:Journal of Electrical Engineering
language:en
Short-container-title:

Author:

Azibi Mourad¹²,Saoula Nadia¹,Aknouche Hamid²

Affiliation:

1. Centre de Développement des Technologies Avancées (CDTA) , HaouchOukil Cité 20 aout 1956 Baba Hassen Alger 16303, Algerie

2. Unité de Recherche Matériaux Procédés et Environnement, Faculté des Sciences de lIngénieur Cité Frantz Fanon , Université MhamedBougara , Boumerdes

Abstract

Abstract In order to study the influence of the substrate bias on the properties of ZrN thin films deposited by radio-frequency magnetron sputtering for biomedical application. Films of ZrN were grown onto 316L stainless steel substrate using radio-frequency (rf) magnetron sputtering from a pure zirconium target in Ar - N2 gas mixture. The substrate bias voltage was varied from 0 to −100 V, which produces a variation in the structural and electrochemical properties of the obtained films. The deposited films were characterized by X-Rays Diffraction, Atomic Force Microscopy, scanning force microscopy and potentiodynamic polarization.

Publisher

Walter de Gruyter GmbH

Link

https://www.sciendo.com/pdf/10.2478/jee-2019-0051

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