Approximate methods for the optical characterization of inhomogeneous thin films: Applications to silicon nitride films
Author:
Affiliation:
1. Department of Physical Electronic, Faculty of Science , Masaryk University , Kotlářská 2, 61137 Brno , Czech Republic
Abstract
Publisher
Walter de Gruyter GmbH
Link
https://www.sciendo.com/pdf/10.2478/jee-2019-0037
Reference49 articles.
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2. [2] Z. Knittl, Optics of Thin Films, Wiley, London, 1976.
3. [3] O. Stenzel, The Physics of Thin Film Optical Spectra, Surface Sciences, Springer, Berlin, 2005.
4. [4] A. Vašíček, “Polarimetric methods for the determination of the refractive index and the thickness of thin films on glass”, J. Opt. Soc. Am., vol. 37, pp. 145–153, 1947.10.1364/JOSA.37.000145
5. [5] I. Ohlídal, K. Navrátil, E. Schmidt, “Simple method for the complete optical analysis of very thick and weakly absorbing films”, Appl. Phys. A, vol. 29, pp. 157–162, 1982.10.1007/BF00617773
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