Surface micromorphology characterization of PDI8-CN2 thin films on H-Si by AFM analysis-Reference-Cited by-同舟云学术

Surface micromorphology characterization of PDI8-CN2 thin films on H-Si by AFM analysis

Published:2020-06-01 Issue:2 Volume:38 Page:334-340
ISSN:2083-134X
Container-title:Materials Science-Poland
language:en
Short-container-title:

Author:

Ţălu Ştefan¹,Kulesza Slawomir²,Bramowicz Miroslaw²,Solaymani Shahram³,Ţălu Mihai⁴,Nezafat Negin Beryani³,Rezaee Sahar³

Affiliation:

1. Technical University of Cluj-Napoca , The Directorate of Research, Development and Innovation Management (DMCDI) , Constantin Daicoviciu St., no. 15, Cluj-Napoca, 400020, Cluj county , Romania

2. University of Warmia and Mazury in Olsztyn , Faculty of Technical Sciences , Oczapowskiego 11, 10-719 Olsztyn , Poland

3. Department of Physics, Kermanshah Branch , Islamic Azad University , Kermanshah , Iran

4. University of Craiova , Faculty of Mechanics, Department of Applied Mechanics and Civil Engineering , Calea Bucureşti St., no. 107, 200512 Craiova, Dolj county , Romania

Abstract

Abstract A nanoscale investigation of three-dimensional (3-D) surface micromorphology of archetypical N, N0- bis (n-etyl) x:y, dicyanoperylene- 3, 4:9, 10 bis (dicarboximide) (PDI8-CN2) thin films on H-Si substrates, which are applicable in n-type semiconducting compounds, has been performed by using fractal analysis. In addition, surface texture characteristics of the PDI8-CN2 thin films have been characterized by using atomic force microscopy (AFM) operated in tapping-mode in the air. These analyses revealed that all samples can be described well as fractal structures at nanometer scale and their three dimensional surface texture could be implemented in both graphical models and computer simulations.

Publisher

Walter de Gruyter GmbH

Subject

Mechanical Engineering,Mechanics of Materials,Condensed Matter Physics,General Materials Science

Link

https://www.sciendo.com/pdf/10.2478/msp-2020-0033

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