Silicon Solar Cells Efficiency Improvement by the Wet Chemical Texturization in the HF/HNO3/Diluent Solution / Poprawa Sprawnosci Krzemowych Ogniw Słonecznych Poprzez Chemiczna Tekturyzacje W Roztworach HF/HNO3/Rozpuszczalnik

Abstract

The paper presents the results of the texturization process of the multicrystalline silicon wafers carried out in ternary HF/HNO3/diluent solution, where the diluent was either CH3COOH or H2O, at varying HF/HNO3 volume ratio and different time of texturization process. The technique of scanning electron microscopy was used to characterize the morphology of the obtained multicrystalline silicon surfaces, with subsequent surface reflectivity measurements. The appropriate selection of mixture components lead to a significant reduction in the reflectivity of the incident solar radiation in the relatively short time of 60 seconds. The resultant electric parameters were nearly the same as those for the commercial samples but obtained after 3 minutes.