The physics and chemistry of plasmas for processing textiles and other materials

Author:

Graham W.G.

Publisher

Elsevier

Reference4 articles.

1. This is a very good beginning level entry point for scientists and engineers interested in the field of low-pressure ionised gases, sources and surface interactions. It is focused largely on aspects of interest to the microelectronics industry;Chapman,1980

2. This book provides a very comprehensive and technically detailed account of the underlying science of low-pressure plasma processing, again orientated to the interests of the microelectronics industry;Lieberman,2005

3. These two ambitious volumes cover the complete spectrum of industrial plasma science and technology from fundamental plasma physics to the engineering details of plasma sources at both low and high pressure;Roth,1995

4. This is a very comprehensive, detailed review of high-pressure non-equilibrium plasmas covering both the underlying science and technology,2005

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