1. Pierson, H.O., Handbook of Chemical Vapor Deposition (CVD): Principles, Technology and Applications, New York: Noyes, 1992.
2. Syrkin, V.G., CVD-metod. Khimicheskoe parofaznoe osazhdenie (CVD. Chemical Vapor Deposition), Moscow: Nauka, 2000.
3. Grodzicki, A., Lakomska, I., Piszcek, P., et al., Coord. Chem. Rev., 2005, vol. 249, p. 2232.
4. Kretzschmar, B.S.M., Assim, K., Preub, A., et al., RSC Adv., 2018, vol. 8, p. 15632.
5. Mungkalasiri, J., Bedel, L., Emieux, F., et al., Chem. Vap. Deposition, 2010, vol. 16, p. 35.