Modification of the Surface Properties of Free Si–Cu Films by Implantation of Active Metal Ions-Reference-Cited by-同舟云学术

Modification of the Surface Properties of Free Si–Cu Films by Implantation of Active Metal Ions

Published:2020-01 Issue:1 Volume:65 Page:114-117
ISSN:1063-7842
Container-title:Technical Physics
language:en
Short-container-title:Tech. Phys.

Author:

Isakhanov Z. A.,Kosimov I. O.,Umirzakov B. E.,Erkulov R. M.

Publisher

Pleiades Publishing Ltd

Subject

Physics and Astronomy (miscellaneous)

Link

https://link.springer.com/content/pdf/10.1134/S1063784220010090.pdf

Reference12 articles.

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4. D. M. Muradkabilov, D. A. Tashmukhamedova, and B. E. Umirzakov, J. Surf. Invest.: X-Ray, Synchrotron Neutron Tech. 7, 967 (2013).

5. B. E. Umirzakov, D. A. Tashmukhamedova, M. K. Ruzibaeva, A. K. Tashatov, S. B. Donaev, and B. B. Mavlyanov, Tech. Phys. 58, 1383 (2013).

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