On the Impedance of the High-Frequency Capacitive Discharge at Different Excitation Methods-Reference-Cited by-同舟云学术

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On the Impedance of the High-Frequency Capacitive Discharge at Different Excitation Methods

Published:2022-01 Issue:1 Volume:48 Page:74-77
ISSN:1063-780X
Container-title:Plasma Physics Reports
language:en
Short-container-title:Plasma Phys. Rep.

Author:

Dvinin S. A.,Sinkevich O. A.,Kodirzoda Z. A.,Solikhov D. K.

Publisher

Pleiades Publishing Ltd

Subject

Physics and Astronomy (miscellaneous),Condensed Matter Physics

Link

https://link.springer.com/content/pdf/10.1134/S1063780X22010044.pdf

Reference18 articles.

1. M. A. Lieberman and A. J. Lichtenberg, Principles of Plasma Discharges and Materials Processing (Wiley, New York, 2005).

2. J. Perrin, J. Schmitt, C. Hollenstein, A. Howling, and L. Sansonnens, Plasma Phys. Control. Fusion. 42, B353 (2000).

3. J. Schmitt, M. Elyaakoubi, and L. Sansonnens, Plasma Sources Sci. Technol. 11, A206 (2002).

4. S. E. Park, B. U. Cho, J. K. Lee, Y. J. Lee, and G. Y. Yeom, IEEE Trans. Plasma Sci. 31, 628 (2003).

5. J. Taillet, Am. J. Phys. 37, 423 (1969).

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