Diffusion of implanted sodium in oxygen-containing silicon-Reference-Cited by-同舟云学术

Diffusion of implanted sodium in oxygen-containing silicon

Author:

Korol’ V. M.,Vedenyapin S. A.,Zastavnoĭ A. V.,Ovchinnikov V.

Publisher

Pleiades Publishing Ltd

Subject

Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Link

Reference16 articles.

2. V. M. Korol’, A. V. Zastavnoĭ, and M. N. Belikova, Fiz. Tekh. Poluprovodn. 9, 1222 (1975) [Sov. Phys. Semicond. 9, 815 (1975)].

3. A. V. Zastavnoĭ, V. M. Korol’, A. N. Mikhalyeva, and V. D. Prozorovskiĭ, Fiz. Tekh. Poluprovodn. 13, 995 (1979).

4. B. I. Boltaks, Diffusion in Semiconductors (Fizmatgiz, Moscow, 1961; Academic Press, New York, 1963), Ch. 4, Sect. 4, p. 133.

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