1. Advanced Plasma Technology, D’Agostino., Favia, P., Kawai, Y., Ikegami, H., Sato, N., and Arefi-Khonsari, F., Eds., Weinheim: Wiley–VCH, 2008.
2. Nojiri, K., Dry Etching Technology for Semiconductors, Tokyo: Springer International, 2015.
3. Pivovarenok, S.A. and Bakshina, P.I., High Energy Chem., 2021, vol. 55, no. 3, p. 233.
4. Murin, D.B., Efremov, A.M., Svettsov, V.I., et al., Izv. Vyssh. Uchebn. Zaved.,
Khim. Khim. Tekhnol., 2013, vol. 56, no. 4, p. 29.
5. Murin, D.B., Efremov, A.M., Svettsov, V.I., et al., Izv. Vyssh. Uchebn. Zaved.,
Khim. Khim. Tekhnol., 2013, vol. 56, no. 8, p. 41.