1. R. P. Seisyan, Zh. Tekh. Fiz. 75(5), 1 (2005) [Tech. Phys. 50, 535 (2005)].
2. I. V. Domracheva, M. V. Petrenko, Z. A. Stepanova, G. K. Tumakaev, and S. V. Bobashev, Pis’ma Zh. Tekh. Fiz. 33(22), 9 (2007) [Tech. Phys. Lett. 33, 945 (2007)].
3. G. Schriever, K. Bergmann, and R. Lebert, J. Vac. Sci. Technol. B 17, 2058 (1999)
4. K. Diefendorff, Extreme Lithography (6/19/2000); http://www.mpronline.com .
5. V. Bakshi, EUV Sources for Lithography (SPIE Press, Bellingham, WA, 2006).