Erratum: Structure and electrical conductivity of polycrystalline silicon films grown by molecular-beam deposition accompanied by low-energy ion bombardment of the growth surface [Semiconductors 31, 237–240 (March 1997)]
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Published:1997-10
Issue:10
Volume:31
Page:1099-1099
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ISSN:1063-7826
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Container-title:Semiconductors
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language:en
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Short-container-title:Semiconductors
Author:
Pavlov D. A.,Khokhlov A. F.,Shungurov D. V.,Shengurov V. G.
Publisher
Pleiades Publishing Ltd
Subject
Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials