1. De Oliveira, V.I., Freire, F.L., Jr., and Zanatta, A.R., Optical Properties of Er and Er + Yb Doped Hydrogenated Amorphous Silicon Films, J. Phys.: Condens. Matter, 2006, vol. 18, pp. 7709–7716.
2. Medvedev, A.V., Pevtsov, A.B., Grudinkin, S.A., Feoktistov, N.A., Sakharov, V.A., Serenkov, I.T., and Golubev, V.G., Emitting a-SiOx(Er) Films and a-SiOx(Er)/a-Si: H Microcavities Doped with Er by Remote Magnetron Sputtering Technique, Nanotecnology, 2008, vol. 19, no. 31, art. 315201.
3. Undalov, Yu.K., Terukov, E.K., Gusev, O.B., Lebedev, V.M., and Trapeznikova, I.N., Effect of Electric Field in the Course of Obtaining a-SiOx: H(Er, O) Films by DC Magnetron Sputtering on Their Composition and Photoluminescence Intensity of Erbium Ions, Fiz. Tekh. Poluprovodn. (St. Petersburg), 2008, vol. 42, no. 11, pp. 1357–1362 [Semiconductors (Engl. transl.), 2008, vol. 42, no. 11, pp. 1327–1334].
4. Dyakov, S.A., Zhigunov, D.M., and Timoshenko, V.Yu., Specific Features of Erbium Ion Photoluminescence in Structures with Amorphous and Crystalline Silicon Nanoclusters in Silica Matrix, Fiz. Tekh. Poluprovodn. (St. Petersburg), 2010, vol. 44, no. 4, pp. 486–490 [Semiconductors (Engl. transl.), 2010, vol. 44, no. 4, pp. 467–471].