Optimization of the tomographic algorithm of the reconstruction of plasma irregularities in process reactors of microelectronics-Reference-Cited by-同舟云学术

Optimization of the tomographic algorithm of the reconstruction of plasma irregularities in process reactors of microelectronics

Published:2011-03 Issue:2 Volume:40 Page:108-118
ISSN:1063-7397
Container-title:Russian Microelectronics
language:en
Short-container-title:Russ Microelectron

Author:

Fadeev A. V.,Rudenko K. V.,Lukichev V. F.,Orlikovskii A. A.

Publisher

Pleiades Publishing Ltd

Subject

Materials Chemistry,Electrical and Electronic Engineering,Condensed Matter Physics,Electronic, Optical and Magnetic Materials

Link

http://link.springer.com/content/pdf/10.1134/S106373971102003X.pdf

Reference8 articles.

1. 450 mm Equipment Performance Metrics, ISMI/SEMATECH Revision 2 IST Final Review 0309, 2009, http://ismi.sematech/research/450 .

2. Roche, G., Arleo, P., and MacDonald, P., Wafer Based Diagnostics for Dielectric Etching Plasmas, Meeting of Plasma Etch Users Group, Northern California AVS, 2007, http://www.avsusergroups.org/peug-pdfs/PEUG-07-5-Roche.pdf .

3. Ochkin, V.N., Spectroscopiya Nizkotemperaturnoi Plazmy, Moscow: Fizmatlit, 2006. [Spectroscopy of Low-Temperature Plasma, (Engl. Transl.), 2009, Germany: Wiley-VCH].

4. Herman, G.T., Image Reconstruction from Projections, New York: Academic, 1980.

5. Fedorov, G.A. and Tereshchenko, S.A., Vychislitel’naya emissionnaya tomografiya (Computational Emission Tomography), Moscow: Energoatomizdat, 1990.

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