1. Cressler, J.D., The Silicon Heterostructure Handbook: Materials, Fabrication, Devices, Circuits, and Applications of SiGe and Si Strained-Layer Epitaxy, London: CRC Press, 2005, p. 1210.
2. Nikiforov, A.Yu. and Skorobogatov, P.K., Physical Bases of Laser Simulation of Volumetric Ionization Effects in ICs and PCs: Linear Model, Mikroelektronika, 2004, vol. 33, no. 2, pp. 91–107.
3. Diez, S., Ullan, M., et al., IHP SiGe:C BiCMOS Technologies as a Suitable Backup Solution for the ATLAS Upgrade Front-End Electronics, IEEE Nuclear Sci. Symp., 2008, vol. N94-4, pp. 3091–3097.
4. Ullan, M., Diez, S., Campabadal, F., Lozano, M., et al. Gamma Radiation Effects on Different Varieties of SiGe:C RBT Technologies, IEEE Trans. on Nuclear Sci., 2007, vol. 54, no. 4, pp. 989–993.