Dependence of the self-sputtering yield upon ion incidence angle-Reference-Cited by-同舟云学术

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Dependence of the self-sputtering yield upon ion incidence angle

Published:2011-04 Issue:2 Volume:5 Page:288-290
ISSN:1027-4510
Container-title:Journal of Surface Investigation. X-ray, Synchrotron and Neutron Techniques
language:en
Short-container-title:J. Synch. Investig.

Author:

Tolmachev A. I.

Publisher

Pleiades Publishing Ltd

Subject

Surfaces, Coatings and Films

Link

http://link.springer.com/content/pdf/10.1134/S1027451011030177.pdf

Reference9 articles.

1. Sputtering by Particle Bombardment, Ed. by R. Behrisch (Springer, New York, 1983; Mir, Moscow, 1984).

2. Fundamental and Applied Aspects of Solid Sputtering, E. S. Mashkov (Mir, Moscow, 1989) [in Russian].

3. N. N. Andrianova, A. M. Borisov, E. S. Mashkova, and A. S. Nemov, Poverkhnost’, No. 3, 77 (2005).

4. P. Sigmund, Phys. Rev. 184, 383 (1969).

5. A. I. Tolmachev, Nucl. Instrum. Methods Phys. Res. B 93, 415 (1994).

Cited by 3 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Evolution of the Energy and Angular Distributions of Emitted Atoms with a Variation in the Atomic Number of the Target Substance;Journal of Surface Investigation: X-ray, Synchrotron and Neutron Techniques;2020-07

2. Emission Theory of the Sputtering of Amorphous Materials: Self-Sputtering;Bulletin of the Russian Academy of Sciences: Physics;2018-02

3. Synthesis and structure of Mg(Fe0.8Ga0.2)2O4−δ film materials;Journal of Surface Investigation. X-ray, Synchrotron and Neutron Techniques;2013-09

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