Formation of Complexes of Phosphorus and Boron Impurity Atoms in Silicon

Author:

Bakhadyrkhanov M. K.,Kenzhaev Z. T.,Koveshnikov S. V.,Usmonov A. A.,Mavlonov G. Kh.

Publisher

Pleiades Publishing Ltd

Subject

Materials Chemistry,Metals and Alloys,Inorganic Chemistry,General Chemical Engineering

Cited by 5 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

1. Effect of transition metals co-dopant on eliminating boron and phosphorous impurities from silicon;Separation and Purification Technology;2024-04

2. Composition of Silicon Alloyed with Gallium and Phosphorus Atoms;Journal of Surface Investigation: X-ray, Synchrotron and Neutron Techniques;2024-02

3. Composition of silicon jointly doped with impurity atoms of gallium and phosphorus;Поверхность. Рентгеновские, синхротронные и нейтронные исследования;2024-01-15

4. A Surface Study of Si Doped Simultaneously with Ga and Sb;East European Journal of Physics;2023-09-04

5. Diffusion of Phosphorus and Gallium from a Deposited Layer of Gallium Phosphide into Silicon;Physics of the Solid State;2022-11

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