Modeling of the Growth Kinetics of Vertically Aligned Carbon Nanotube Arrays on Planar Substrates and an Algorithm for Calculating Rate Coefficients of This Process-Reference-Cited by-同舟云学术

Modeling of the Growth Kinetics of Vertically Aligned Carbon Nanotube Arrays on Planar Substrates and an Algorithm for Calculating Rate Coefficients of This Process

Published:2021-01 Issue:1 Volume:57 Page:20-29
ISSN:0020-1685
Container-title:Inorganic Materials
language:en
Short-container-title:Inorg Mater

Author:

Bulyarskiy S. V.,Lakalin A. V.,Molodenskii M. S.,Pavlov A. A.,Ryazanov R. M.

Publisher

Pleiades Publishing Ltd

Subject

Materials Chemistry,Metals and Alloys,Inorganic Chemistry,General Chemical Engineering

Link

http://link.springer.com/content/pdf/10.1134/S0020168521010015.pdf

Reference34 articles.

1. Bulyarskiy, S. and Saurov, A., Doping of Carbon Nanotubes, Cham: Springer International, 2017.https://doi.org/10.1007/978-3-319-55883-7

2. Bulyarskiy, S.V., Zenova, E.V., Lakalin, A.V., Molodenskii, M.S., Pavlov, A.A., Tagachenkov, A.M., and Terent’ev, A.V., Influence of a buffer layer on the formation of a thin-film nickel catalyst for carbon nanotube synthesis, Tech. Phys., 2018, vol. 88, no. 12, pp. 1834–1839.https://doi.org/10.1134/S1063784218120253

3. Hu, M.H., Murakami, Y., Ogura, M., Maruyama, S., and Okubo, T., Morphology and chemical state of Co–Mo catalysts for growth of single-walled carbon nanotubes vertically aligned on quartz substrates, J. Catal., 2004, vol. 225, no. 1, pp. 230–239.https://doi.org/10.1016/j.jcat.2004.04.013

4. Gromov, D.G., Bulyarskii, S.V., Dubkov, S.V., Pavlov, A.A., Skorik, S.N., Trifonov, A.Yu., Shulyat’ev, A.S., Shaman, Yu.P., Kitsyuk, E.P., Dudin, A.A., Sirotina, A.P., and Gavrilov, S.A., CVD-growth of CNT with the use of catalytic Ct–Me–N–O thin films incorporated in the technology, Russ. Microelectron., 2017, vol. 46, no. 2, pp. 75–81.https://doi.org/10.1134/S1063739717020032

5. Puretzky, A.A., Geohegan, D.B., Jesse, S., Ivanov, I.N., and Eres, G., In situ measurements and modeling of carbon nanotube array growth kinetics during chemical vapor deposition, Appl. Phys. A, 2005, vol. 81, pp. 223–240.https://doi.org/10.1007/s00339-005-3256-7

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