Selecting a Target for Obtaining Films of Higher Manganese Silicide Using Magnetron Sputtering-Reference-Cited by-同舟云学术

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Selecting a Target for Obtaining Films of Higher Manganese Silicide Using Magnetron Sputtering

Published:2024-06 Issue:3 Volume:69 Page:374-379
ISSN:1063-7745
Container-title:Crystallography Reports
language:en
Short-container-title:Crystallogr. Rep.

Author:

Lukasov M. S.,Arkharova N. A.,Orekhov A. S.,Kamilov T. S.,Klechkovskaya V. V.

Publisher

Pleiades Publishing Ltd

Link

https://link.springer.com/content/pdf/10.1134/S106377452460042X.pdf

Reference20 articles.

1. P. Shostakovskii, Kompon. Tekhnol., No. 12, 120 (2009).

2. P. Shostakovskii,. Kompon. Tekhnol., No. 12, 131 (2010).

3. Yu. P. Pustovalov, M. I. Pankin, Yu. P. Prilepo, et al., Kosm. Tekh. Tekhnol., No. 1 (12), 517 (2016).

4. M. I. Fedorov, Doctoral Dissertation in Physics and Mathematics (Ioffe Institute, St. Petersburg, 2007).

5. V. K. Zaitsev and D. M. Rowe, CRC Handbook of Thermoelectrics (CRC Press, 1995), p. 299.

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