Formation of oriented rodlike nickel silicide precipitates during magnetron deposition of carbon and nickel on silicon-Reference-Cited by-同舟云学术

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Formation of oriented rodlike nickel silicide precipitates during magnetron deposition of carbon and nickel on silicon

Published:2011-02 Issue:1 Volume:5 Page:65-69
ISSN:1027-4510
Container-title:Journal of Surface Investigation. X-ray, Synchrotron and Neutron Techniques
language:en
Short-container-title:J. Synch. Investig.

Author:

Chernykh P. N.,Chechenin N. G.,Sergachev I. A.,Timofeev M. A.

Publisher

Pleiades Publishing Ltd

Subject

Surfaces, Coatings and Films

Link

http://link.springer.com/content/pdf/10.1134/S1027451011010083.pdf

Reference10 articles.

1. K. N. Tu and J. W. Mauer, Thin Film Interdiffusion and Reastions, Ed. by J. M. Poate et al. (Wiley, New York, 1978), p. 359.

2. S. Murarka, Silicides for VLSI Applications (Academic, New York, 1983; Mir, Moscow, 1986).

3. Yu. D. Chistyakov and Yu. P. Rainova, Physico-Chemical Principles of Microelectronic Technology (Metallurgiya, Moscow, 1979) [in Russian].

4. M. A. Nicolet and S. S. Lau, Microstructure Science, Vol. 6 (Academic, New York, 1983), p. 329.

5. D. Z. Chi, D. Mangelinck, A. S. Zuruzi, et al., J. Electron. Mater. 30, 1483 (2001).

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