Molecular Dynamics Simulation of Physical Sputtering of Nanoporous Silicon-Based Materials with Low Energy Argon
Author:
Publisher
Pleiades Publishing Ltd
Subject
Surfaces, Coatings and Films
Link
http://link.springer.com/content/pdf/10.1134/S1027451019010191.pdf
Reference22 articles.
1. M. R. Baklanov, J.-F. de Marneffe, D. Shamiryan, et al., J. Appl. Phys. 113, 041101 (2013). doi 10.1063/1.4765297
2. A.-P. Prskabo, S. Schmauder, C. Ziebert, et al., Comput. Mater. Sci. 50, 1320 (2011). doi 10.1016/j.commatsci.2010.08.006
3. N. A. Kubota, D. J. Economou, and S. J. Plimpton, J. Appl. Phys. 83, 4055 (1998). doi 10.1063/1.367225
4. P. C. Zalm, J. Appl. Phys. 54, 2660 (1983). doi 10.1063/1.332340
5. D. B. Graves and P. Brault, J. Phys. D: Appl. Phys. 42, 194011 (2009). doi 10.1088/022-3727/42/19/194011
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