Influence of elastic-scattering processes on an X-ray photoelectron spectroscopy signal: Effect of the underlying surface-Reference-Cited by-同舟云学术

Influence of elastic-scattering processes on an X-ray photoelectron spectroscopy signal: Effect of the underlying surface

Published:2017-09 Issue:5 Volume:11 Page:963-968
ISSN:1027-4510
Container-title:Journal of Surface Investigation: X-ray, Synchrotron and Neutron Techniques
language:en
Short-container-title:J. Synch. Investig.

Author:

Kaplya P. S.,Afanas’ev V. P.

Publisher

Pleiades Publishing Ltd

Subject

Surfaces, Coatings and Films

Link

http://link.springer.com/content/pdf/10.1134/S1027451017050056.pdf

Reference15 articles.

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2. S. Hoffman, Auger and X-Ray Photoelectron Spectroscopy in Material Science (Springer, Berlin, Heidelberg, 2013).

3. S. Tougaard, J. Vac. Sci. Technol., A 14 (3), 1415 (1996).

4. V. P. Afanas’ev, D. S. Efremenko, D. A. Ivanov, P. S. Kaplya, et al., J. Surf. Invest.: X-ray, Synchrotron Neutron Tech. 8 (1), 71 (2014).

5. V. P. Afanas’ev, O. Yu. Golovina, A. S. Gryazev, P. S. Kaplya, et al., J. Vac. Sci. Technol., B: Microelectron. Nanometer Struct.–Process., Meas., Phenom. 33 (3), 03 D101 (2015).

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