1. N. V. Gavrilov and S. E. Romanov, Zh. Tekh. Fiz. 69(5), 20 (1999) [Tech. Phys. 44, 497 (1999)].
2. A. V. Rogov and K. Yu. Yukolov, Zh. Tekh. Fiz. 76(4), 109 (2006) [Tech. Phys. 51, 499 (2006)].
3. B. I. Moskalev, Discharge with a Hollow Cathode (Energiya, Moscow, 1969), p. 10 [in Russian].
4. B. S. Danilin, Low-Temperature Plasma Deposition of Thin Films (Energoatomizdat, Moscow, 1989), p. 59 [in Russian].
5. V. T. Barchenko, Yu. A. Bystrov, and E. A. Kolgin, Ion-Plasma Technologies in Electronic Production (Energoatomizdat, St. Petersburg, 2001), p. 31 [in Russian].