Relationships of the synthesis of silicon dioxide nanoparticles in low-temperature plasma created in helium and argon at atmospheric pressure
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Published:2015-11
Issue:11
Volume:88
Page:1750-1756
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ISSN:1070-4272
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Container-title:Russian Journal of Applied Chemistry
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language:en
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Short-container-title:Russ J Appl Chem
Author:
Kretusheva I. V.,Mishin M. V.,Alexandrov S. E.
Publisher
Pleiades Publishing Ltd
Subject
General Chemical Engineering,General Chemistry
Reference12 articles.
1. Alexandrov, S.E. and Hichman, M.L., Chemical Vapor Deposition: Precursors, Process and Applications, Jones, C. and Hichman, M.L., Eds., Royal Society of Chemistry, 2009, p. 582. 2. Kouprine, A., Gitzhofer, F., Boulos, M., and Veres, T., Carbon, 2006, vol. 44, no. 13, pp. 2593–2601. 3. Barankin, M.D., Creyghton, Y., and Schmidt-Ott, A., J. Nanopart. Res., 2006, vol. 8, pp. 511–517. 4. Chen, C., Bai, H., Chein, H., and Chen, T., Aerosol Sci. Technol., 2007, vol. 41, no. 11, pp. 1018–1028. 5. Ghosh, S., Tianqi Liu, T., Mihai Bilici, M., et al., J. Phys. D: Appl., 2015, vol. 48, no. 32, p. 314003.
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