Dynamics of Deposition and Removal of a Fluorocarbon Film in the Cyclic Process of Plasma-Chemical Etching of Silicon
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Published:2024-04
Issue:4
Volume:88
Page:447-453
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ISSN:1062-8738
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Container-title:Bulletin of the Russian Academy of Sciences: Physics
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language:en
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Short-container-title:Bull. Russ. Acad. Sci. Phys.
Publisher
Pleiades Publishing Ltd
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