Masking Properties of Structures Based on a Triacrylamide Derivative of Polyfluorochalcone at Wet and Reactive Ion Etching

Author:

Derevyashkin S. V.,Soboleva E. A.,Shelkovnikov V. V.,Malyshev A. I.,Korolkov V. P.

Publisher

Pleiades Publishing Ltd

Subject

Materials Chemistry,Electrical and Electronic Engineering,Condensed Matter Physics,Electronic, Optical and Magnetic Materials

Reference30 articles.

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4. Mironnikov, N.G., Korol’kov, V.P., Derevyanko, D.I., and Shelkovnikov, V.V., Optical methods for the formation of a multilevel microrelief in thin films of the hybrid photopolymer material GIBRIMER-TATS, Interekspo Geo-Sibir’, 2016, vol. 5, no. 2, pp. 15–19.

5. Lagov, P.B., Drenin, A.S., Rogovskii, E.S., and Lednev, A.M., Research of possibilities for improving the energy and mass parameters of solar cells using plasma-chemical etching, Izv. Vyssh. Uchebn. Zaved., Mater. Elektron. Tekh., 2013, no. 3 (63), pp. 51–53.

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