Author:
Makhviladze T. M.,Sarychev M. E.
Subject
Materials Chemistry,Electrical and Electronic Engineering,Condensed Matter Physics,Electronic, Optical and Magnetic Materials
Reference14 articles.
1. Klinger, L., Levin, L., and Srolovitz, O., Morfological stability of a heterophase inyerface under electromigration conditions, J. Appl. Phys., 1996, vol. 79, no. 9, pp. 6834–6839.
2. Goldstein, R.V., Makhviladze, T.M., and Sarychev, M.E., Electromigration-induced instability of the interface between solid conductors, Fiz. Mezomekh., 2016, vol. 19, no. 6, pp. 19–26.
3. Makhviladze, T.M. and Sarychev, M.E., Instability of interfaces between conducting layers of integrated circuit elements under the influence of electric current and mechanical stresses, Fiz. Mezomekh., 2022, vol. 25, no. 1, pp. 26–34.
4. Makhviladze, T.M. and Sarychev, M.E., Effect of point defects on the electromigration rate at the interface of joined materials, Russ. Microelectron., 2020, vol. 49, no. 6, pp. 423–430.
5. Goldstein, R.V. and Sarychev, M.E., Influence of lattice defects on the surface tension of an interface between materials, Poverkhnost’, 2004, no. 8, pp. 93–97.
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