Secondary ion mass spectrometer based on a high-dose ion implanter-Reference-Cited by-同舟云学术

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Secondary ion mass spectrometer based on a high-dose ion implanter

Published:2007-06 Issue:6 Volume:52 Page:770-775
ISSN:1063-7842
Container-title:Technical Physics
language:en
Short-container-title:Tech. Phys.

Author:

Baturin V. A.,Eremin S. A.,Pustovoĭtov S. A.

Publisher

Pleiades Publishing Ltd

Subject

Physics and Astronomy (miscellaneous)

Link

http://link.springer.com/content/pdf/10.1134/S1063784207060163.pdf

Reference12 articles.

1. J. F. Hennequin, J. Phys. 29, 957 (1968).

2. K. Wittmaack, Surf. Sci. 53, 626 (1975).

3. N. V. Pleshivtsev, Physical Problems of Cathode Sputtering (Inst. At. Énergii im. Kurchatova, Moscow, 1979) [in Russian].

4. V. T. Cherepin, Ion Microprobe Analysis (Naukova Dumka, Kiev, 1992) [in Russian].

5. V. A. Baturin and S. A. Eremin, Prib. Tekh. Éksp., No. 2, 120 (2005).

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