RF exciplex halogen source of UV radiation on an argon-xenon-chlorine mixture-Reference-Cited by-同舟云学术

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RF exciplex halogen source of UV radiation on an argon-xenon-chlorine mixture

Published:2008-05 Issue:5 Volume:53 Page:658-660
ISSN:1063-7842
Container-title:Technical Physics
language:en
Short-container-title:Tech. Phys.

Author:

Shuaibov A. K.,Shevera I. V.,Grabovaya I. A.

Publisher

Pleiades Publishing Ltd

Subject

Physics and Astronomy (miscellaneous)

Link

http://link.springer.com/content/pdf/10.1134/S1063784208050216.pdf

Reference9 articles.

1. A. K. Shuaibov, A. I. Dashchenko, and I. V. Shevera, Opt. Spektrosk. 92, 753 (2002) [Opt. Spectrosc. 92, 690 (2002)].

2. Yu. P. Raizer and M. N. Shneider, Fiz. Plazmy 18, 1476 (1992) [Sov. J. Plasma Phys. 18, 762 (1992)].

3. A. K. Shuaibov, A. I. Dashchenko, and I. V. Shevera, Pis’ma Zh. Tekh. Fiz. 28(6), 23 (2002) [Tech. Phys. Lett. 28, 330 (2002)].

4. A. K. Shuaibov, A. I. Dashchenko, and I. V. Shevera, Ukr. Phys. J. 47, 346 (2002).

5. A. P. Golovitskii Pis’ma Zh. Tekh. Fiz. 24(6), 63 (1998) [Tech. Phys. Lett. 24, 233 (1998)].

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1. Radiant characteristics of high power excilamps with binary exciplexes of XeCl and XeBr;Journal of Physics D: Applied Physics;2019-03-18

2. Numerical Investigation of Effect of Driving Voltage Pulse on Low Pressure 90%Ar–10%Cl2 Dielectric Barrier Discharge;Plasma Chemistry and Plasma Processing;2017-09-30

3. Physical and chemical properties of low-pressure argon-chlorine dielectric barrier discharge;Physics of Plasmas;2016-03

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