1. V. G. Syrkin, CVD-Method. Chemical Vapor-Phase Deposition [in Russian], Nauka, Moscow (2000).
2. T. P. Smirnova, Fundamental Bases of Chemical Vapour Deposition Procesess of Films and Structures for Nanoelectronics [in Russian], Publishing House of the Siberian Branch of the Russian Academy of Sciences, Novosibirsk (2013).
3. W. L. Gladfelter, Chem. Mater., 5, No. 10, 1372–1388 (1993).
4. N. V. Gelfond, N. B. Morozova, P. P. Semyannikov, et al., J. Struct. Chem., 53, No. 4, 715–724 (2012).
5. A. Devi, S. A. Shivashankar, and A. G. Samuelson, J. Phys. IV, 12, No. Pr4, 139–146 (2002).