Monte Carlo modelling of wet-chemical lithography with masks
Author:
Publisher
Pleiades Publishing Ltd
Subject
General Chemical Engineering,General Chemistry
Link
http://link.springer.com/content/pdf/10.1134/S0040579513050266.pdf
Reference22 articles.
1. Novas, J.M. and Henning, G.P., A comprehensive constraint programming approach for the rolling horizonbased scheduling of automated wet-etch stations, Comput. Chem. Eng., 2012, vol. 42, p. 189.
2. Zhu, Z. and Liu, C., Micromachining process simulation using a continuous cellular automata method, J. Microelectromech. Syst., 2000, vol. 9, p. 252.
3. Ehrfeld, W., Hessel, V., and Lowe, H., Microreactors: New Technology for Modern Chemistry, Weinheim: Wiley, 2000.
4. Larosa, C., Salerno, M., Nanni, P., and Reverberi, A.P., Cobalt cementation in ethanol-water system: kinetics and morphology of metal aggregates, Ind. Eng. Chem. Res., 2012, vol. 51, p. 16564.
5. Herrero, D., Valle, F., Greco, P., Ingo, et al., One-step substrate nanofabrication and patterning of nanoparticles by lithographically controlled etching, Nanotecnology, 2011, vol. 22, art. 355301.
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