Features of the Structure and the Optical and Electrical Properties of SiO2:Cu° Thin Films Deposited by Pulsed-Laser Evaporation-Reference-Cited by-同舟云学术

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Features of the Structure and the Optical and Electrical Properties of SiO2:Cu° Thin Films Deposited by Pulsed-Laser Evaporation

Published:2023-04 Issue:2 Volume:18 Page:257-263
ISSN:2635-1676
Container-title:Nanobiotechnology Reports
language:en
Short-container-title:Nanotechnol Russia

Author:

Boiko A. A.,Al-Kamali M. F. S. H.,Mikhalko A. M.,Frolov S. A.

Publisher

Pleiades Publishing Ltd

Subject

Electrical and Electronic Engineering,Engineering (miscellaneous),Condensed Matter Physics,General Materials Science,Biomedical Engineering,Bioengineering

Link

https://link.springer.com/content/pdf/10.1134/S2635167623700118.pdf

Reference20 articles.

1. E. V. Berlin, S. A. Dvinin, and L. A. Seidman, Vacuum Technology and Equipment for Deposition and Etching of Thin Films (Tekhnosfera, Moscow, 2007) [in Russian].

2. V. V. Luchinin and A. Yu.Savenko, Nanoscale Ion-Beam Technologies. Nanotechnology: Physics, Processes, Diagnostics (Fizmatlit, Moscow, 2006) [in Russian].

3. A. Ivanov and B. Smirnov, Nanoindustriya No. 6, 28 (2012).

4. J. Chen, Q. Yu, X. Cui, et al., J. Mater. Chem. 38, 11710 (2019).

5. S. Amrut, S. Lanje, J. Sh. Satish, et al., Adv. Appl. Sci. Res, No. 1, 36 (2010).

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