Polymers for nanolitography: New strategy of the design and synthesis of copolymers based on methacrylic acid derivatives with cyclobutyldicyclopropylmethyloxymethyl, 3-sulfolanyl, and 1-perfluoroethylcyclohexyl pendant groups-Reference-Cited by-同舟云学术

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Polymers for nanolitography: New strategy of the design and synthesis of copolymers based on methacrylic acid derivatives with cyclobutyldicyclopropylmethyloxymethyl, 3-sulfolanyl, and 1-perfluoroethylcyclohexyl pendant groups

Published:2013-04 Issue:2 Volume:449 Page:53-57
ISSN:0012-5016
Container-title:Doklady Physical Chemistry
language:en
Short-container-title:Dokl Phys Chem

Author:

Vainer A. Ya.,Dyumaev K. M.,Eremina L. A.,Malbin L. A.,Pronyagin P. V.,Sukharskaya Sh. N.

Publisher

Pleiades Publishing Ltd

Subject

Physical and Theoretical Chemistry

Link

http://link.springer.com/content/pdf/10.1134/S0012501613040039.pdf

Reference15 articles.

1. Yudintsev, V., Elektronika. Nauka. Tekhnol. Biznes, 2008 no. 3, pp. 124–129.

2. Makushin, M., Elektronika. Nauka. Tekhnol. Biznes, 2010, no. 3, pp. 46–55.

3. Vainer, A.Ya., Dyumaev, K.M., Eremina, L.A., et al., Dokl. Chem., 2010, vol. 435,part 1, pp. 275–278.

4. Haggis, G.A. and Owen, L.N., J. Chem. Soc., 1953, no. 2, pp. 404–407.

5. Reynolds, D.W., Cassidy, P.E., Johnson, C.G., and Cameron, M.L., Org. Chem., 1990, vol. 55, no. 14, pp. 4448–4454.

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